1
Factors affecting oxidation pond performance | |
Author | Kazimi, Mohammed Amin |
Call Number | AIT Thesis no. EV-79-14 |
Subject(s) | Sewage--Purification--Oxidation |
Note | A thesis submitted in partial fulfillment of the requirements for the degree of Master of Engineering, School of Engineering and Technology |
Publisher | Asian Institute of Technology |
Abstract | A series of ponds were used in this study one facultative pond followed by two polishing ponds with organic loading varied from 112-337 kg BOD5/ha-day under the four runs. AIT sewage was used in this study. Along with this, the effects of other parameters, such as dissolved oxygen, pH, alkalinity, light intensity and temperature, in ponds performance have also been evaluated. In this study the optimum organic loading in a facultative pond was found to be 225 kg BOD5/ha-day with 5 days detention time and 89.5 per cent BOD5 removal. The overall BOD5 removal was 93.5 per cent with average filtered BOD5 effluent of 8.5 mg/l. Reduced COD removal was observed as the wastes passed through the second and third stage polishing ponds. 99.997 per cent coliform removal was achieved from the final effluent during the first organic loading. It was also found out, that the function of series polishing ponds were much more efficient in pathogen removal rather than BOD reduction. Generally environmental conditions such as light intensity and temperature was very favorable as well as dissolved oxygen, pH, alkalinity and algae concentration through out the experiment period. |
Year | 1979 |
Type | Thesis |
School | School of Environment, Resources, and Development |
Department | Department of Energy and Climate Change (Former title: Department of Energy, Environment, and Climate Change (DEECC)) |
Academic Program/FoS | Environmental Engineering and Management (EV) |
Chairperson(s) | Samorn Muttamara ; Chongrak Polprasert |
Examination Committee(s) | Lohani, Bindu N. |
Scholarship Donor(s) | World Health Organization |
Degree | Thesis (M.Eng.) - Asian Institute of Technology, 1979 |